1. Chemical Processing Plant Leak Detection
Monitoring for leaks of highly corrosive or hazardous chemicals such as acids and ammonia in critical processing areas to prevent environmental contamination and ensure worker safety.
Problem SolvedProvides reliable, early detection and emergency shutdown capabilities for aggressive chemical leaks, safeguarding personnel, equipment, and the environment, justified by its chemical-resistant PFA enclosure, two-stage detection, and SIL3 safety rating.
Chemical resistancePFA enclosureSIL3NPN output12-24VDCIP67
2. Semiconductor Manufacturing Wet Bench Safety
Detecting leaks of etchants and cleaning solutions, including hydrofluoric acid and Fluorinert™, within sensitive semiconductor wet processing stations to maintain product quality and operational integrity.
Problem SolvedEnsures precise and rapid detection of trace amounts of aggressive liquids, preventing costly contamination of wafers and equipment. This is supported by its specific sensing capabilities for Fluorinert™, PFA material construction, and a fast 10ms response time for incipient leaks.
Fluorinert™ detectionPFA10ms response timeIP6712-24VDCTwo-stage detection
3. Pharmaceutical Production Line Spill Monitoring
Safeguarding against accidental spills of active pharmaceutical ingredients (APIs) or cleaning agents in sterile pharmaceutical production environments to prevent product contamination and ensure compliance.
Problem SolvedMaintains stringent cleanliness standards and product integrity by offering precise, chemical-resistant leak detection with robust IP67/IP65 ratings, suitable for frequent washdowns and sensitive processes. Its standalone SIL1 capability ensures basic functional safety.
Chemical resistanceIP67/IP65-10 to +55°C operating tempNPN outputSIL1 (standalone)